A remote plasma (also downstream plasma or afterglow plasma) is a plasma processing method in which the plasma and material interaction occurs at a location remote from the plasma in the plasma afterglow.[1][2]
See also
Chemical vapor deposition
Corona treatment
List of plasma (physics) applications articles
Physical vapor deposition
Plasma activation
Plasma chemistry
Plasma cleaning
Plasma-activated bonding
Reactive ion etching
References
Tommi Kääriäinen; David Cameron; Marja-Leena Kääriäinen; Arthur Sherman (17 May 2013). Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications. Wiley. pp. 21–. ISBN 978-1-118-74742-1.
Alexander Fridman (5 May 2008). Plasma Chemistry. Cambridge University Press. pp. 532–. ISBN 978-1-139-47173-2.
Hellenica World - Scientific Library
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